Developer 利用鹼性顯影液將光阻(PR, Photo Resist)經曝光後形成的有機酸中和、剝落，留下未反應的光阻圖案。 TMAH NaOH KOH Etchant Al etchant Mo etchant Cu etchant H3PO4 HNO3 H2SO4 HAc HF Oxalic acid dihydrate ITO Etchant MAE Ferric chloride HCL EMN Stripper DMSO BDG MEA NMP Cu Stripper TRIETHANOLAMINE Dimethyl acetamide BM-37 BM-73 MD-73 BT-53 SF-D20 SF-M15 SBM-31 Stripper-10 ST-02 SDN-64 SNT-35 Thinner & EBR PP73, PP82 PGME PGMEA Anone CPN Clean Solvent n-Butyl acetate Benzyl alcohol ETHYLENE GLYCOL Detergent(GDS-155) Stripper RGB Rework RGB Rework chemical Others NH4OH H2O2 POCl3 POCl3 N2O N2O